Application of selective contacts for study of silicon surface degradation. (December 2020)
- Record Type:
- Journal Article
- Title:
- Application of selective contacts for study of silicon surface degradation. (December 2020)
- Main Title:
- Application of selective contacts for study of silicon surface degradation
- Authors:
- Kudryashov, D A
Maksimova, A A
Baranov, A I
Uvarov, A V
Morozov, I A
Gudovskikh, A S - Abstract:
- Abstract: In this work an application of selective contacts p-Si/MoOx for evaluation of silicon surface degradation is shown. Using a method of I-V measurements the effect of silicon surface degradation during SiO2 magnetron deposition was demonstrated.
- Is Part Of:
- Journal of physics. Volume 1695(2020)
- Journal:
- Journal of physics
- Issue:
- Volume 1695(2020)
- Issue Display:
- Volume 1695, Issue 1 (2020)
- Year:
- 2020
- Volume:
- 1695
- Issue:
- 1
- Issue Sort Value:
- 2020-1695-0001-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-12
- Subjects:
- Physics -- Congresses
530.5 - Journal URLs:
- http://www.iop.org/EJ/journal/1742-6596 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1742-6596/1695/1/012084 ↗
- Languages:
- English
- ISSNs:
- 1742-6588
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5036.223000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 25470.xml