Surface activated bonding of aluminum oxide films at room temperature. (15th January 2021)

• Record Type: Journal Article
• Authors: Utsumi, Jun; Takigawa, Ryo
• Is Part Of: Scripta materialia. Number 191(2021)
• Page Start: 215
• Page End: 218
• Publication Date: 2021-01-15
• Subjects: Room temperature bonding -- Surface activated bonding -- Bonding of Al2O3; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2020.09.005
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: We have investigated the surface activated bonding (SAB) of deposited Al2 O3 films by chemical vapor deposition under a short-time activated condition at room temperature. Although the surface energy for bonding of Al2 O3 films was very low, that of Al2 O3 film/sapphire bonding was approximately 1 J m − 2 and more than 2 J m − 2 for sapphire/sapphire bonding. Transmission electron microscopy showed an amorphous-like intermediate layer approximately 1 nm thick, observed at the bonding interface of Al2 O3 /Al2 O3, but not in the bonding of Al2 O3 /sapphire, which suggests that the crystallinity of the Al2 O3 film affects the bonding of Al2 O3 . Graphical abstract: Image, graphical abstract