A novel analytical approach to describe the simultaneous diffusional growth of multilayer stoichiometric compounds in binary reactive diffusion couples. (15th January 2021)

• Record Type: Journal Article
• Authors: Ma, Sa; Xing, Fangzhou; Deng, Chunming; Zhang, Lijun
• Is Part Of: Scripta materialia. Number 191(2021)
• Page Start: 111
• Page End: 115
• Publication Date: 2021-01-15
• Subjects: Intermetallic compounds -- Diffusion -- Kinetics -- Modeling -- Multilayer growth; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2020.09.025
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: In this paper, we developed a novel analytical approach for description of the diffusion-controlled simultaneous growth of multilayer stoichiometric compounds in binary reactive diffusion couples. The approach was directly extended to describe the compounds with narrow/certain homogeneity ranges. The models were then applied to three different real cases in technically important Co–Si and Cu–In binary systems. The predicted thickness curves/composition profiles revealed a satisfactory agreement with all the experimental data. The successful applications indicate that the approach can serve as an efficient way for describing the multi-layer growth in the joining, coating, and solar cell industries. Graphical abstract: Image, graphical abstract