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HARVARD Citation
Krueger, T. et al. (2020). Deposition of SiOx thin films using hexamethyldisiloxane in atmospheric pressure plasma enhanced chemical vapor deposition. Journal of physics. p. . [Online].
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Krueger, T. et al. (2020). Deposition of SiOx thin films using hexamethyldisiloxane in atmospheric pressure plasma enhanced chemical vapor deposition. Journal of physics. p. . [Online].