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HARVARD Citation
Li, T. et al. (2021). Interface control of tetragonal ferroelectric phase in ultrathin Si-doped HfO2 epitaxial films. Acta materialia. p. . [Online].
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Li, T. et al. (2021). Interface control of tetragonal ferroelectric phase in ultrathin Si-doped HfO2 epitaxial films. Acta materialia. p. . [Online].