Simulation and Experiment of Localized Electrochemical Deposition with Re‐Entrant Structures by Applying the Tip Effect. Issue 2 (19th January 2023)

• Record Type: Journal Article
• Authors: Xu, Jinkai; Zou, Zhaoqiang; Ren, Wanfei; Xu, Zhenming; Wang, Xue
• Is Part Of: Advanced engineering materials. Volume 25:Issue 2(2023)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2023-01-19
• Subjects: Materials -- Periodicals; 620.11
• DOI: 10.1002/adem.202370006
• Languages: English
• ISSNs: 1438-1656

Abstract

Abstract : A novel approach of localized electrochemical deposition under the tip effect is proposed to manufacture re‐entrant structures, as described in the article number 2200881 by Jinkai Xu, Wanfei Ren, and co‐workers. Employing the tip effect, the electrochemical reduction rate at the edges of the micro‐pillar is fast, and the formation of re‐entrant structures is controlled to achieve high‐efficiency fabrication of large areas.