Facile production of ultra-fine silicon nanoparticles. Issue 9 (16th September 2020)

• Record Type: Journal Article
• Authors: Tokarska, Klaudia; Shi, Qitao; Otulakowski, Lukasz; Wrobel, Pawel; Ta, Huy Quang; Kurtyka, Przemyslaw; Kordyka, Aleksandra; Siwy, Mariola; Vasylieva, Margaryta; Forys, Aleksander; Trzebicka, Barbara; Bachmatiuk, Alicja; Rümmeli, Mark H.
• Is Part Of: Royal Society open science. Volume 7:Issue 9(2020)
• Publication Date: 2020-09-16
• Subjects: ultra-fine silicon -- Si nanoparticle -- trichlorosilane -- synthesis; Science -- Periodicals; 500
• DOI: 10.1098/rsos.200736
• Languages: English
• ISSNs: 2054-5703

Abstract

Abstract : A facile procedure for the synthesis of ultra-fine silicon nanoparticles without the need for a Schlenk vacuum line is presented. The process consists of the production of a (HSiO1.5 ) n sol–gel precursor based on the polycondensation of low-cost trichlorosilane (HSiCl3 ), followed by its annealing and etching. The obtained materials were thoroughly characterized after each preparation step by electron microscopy, Fourier transform and Raman spectroscopy, X-ray dispersion spectroscopy, diffraction methods and photoluminescence spectroscopy. The data confirm the formation of ultra-fine silicon nanoparticles with controllable average diameters between 1 and 5 nm depending on the etching time.