(Invited) Ultralow-Voltage Design and Technology of Silicon-on Thin-Buried-Oxide (SOTB) CMOS for High Energy Efficient Electronics in IoT Era. (27th March 2015)
- Record Type:
- Journal Article
- Title:
- (Invited) Ultralow-Voltage Design and Technology of Silicon-on Thin-Buried-Oxide (SOTB) CMOS for High Energy Efficient Electronics in IoT Era. (27th March 2015)
- Main Title:
- (Invited) Ultralow-Voltage Design and Technology of Silicon-on Thin-Buried-Oxide (SOTB) CMOS for High Energy Efficient Electronics in IoT Era
- Authors:
- Yamamoto, Yoshiki
Makiyama, Hideki
Yamashita, Tomohiro
Oda, Hidekazu
Kamohara, Shiro
Sugii, Nobuyuki
Yamaguchi, Yasuo
Mizutani, Tomoko
Kobayashi, Masaharu
Hiramoto, Toshiro - Abstract:
- Abstract : We demonstrated ultralow voltage (<0.4V) operation of Silicon-on-Thin-Buried-oxide (SOTB) CMOS. Thanks to the small variability of SOTB Vmin of SRAM was lowered down to <0.4 V. Both fast access time and small standby leakage were achieved by adaptive back biasing (ABB). 32-bit RISC CPU operated at ultralow energy consumption of 13.4 pJ.
- Is Part Of:
- ECS transactions. Volume 66:Number 5(2015)
- Journal:
- ECS transactions
- Issue:
- Volume 66:Number 5(2015)
- Issue Display:
- Volume 66, Issue 5 (2015)
- Year:
- 2015
- Volume:
- 66
- Issue:
- 5
- Issue Sort Value:
- 2015-0066-0005-0000
- Page Start:
- 43
- Page End:
- 48
- Publication Date:
- 2015-03-27
- Subjects:
- Electrochemistry -- Periodicals
Electrochemistry
Periodicals
Electronic journals
Electronic journal
541.37 - Journal URLs:
- http://ecsdl.org/ECST/ ↗
http://rzblx1.uni-regensburg.de/ezeit/warpto.phtml?colors=7&jour_id=81944 ↗
https://iopscience.iop.org/journal/1938-5862 ↗
http://www.electrochem.org/ ↗ - DOI:
- 10.1149/06605.0043ecst ↗
- Languages:
- English
- ISSNs:
- 1938-5862
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 25055.xml