High-performance ITO/a-IGZO heterostructure TFTs enabled by thickness-dependent carrier concentration and band alignment manipulation. Issue 4 (15th February 2023)
- Record Type:
- Journal Article
- Title:
- High-performance ITO/a-IGZO heterostructure TFTs enabled by thickness-dependent carrier concentration and band alignment manipulation. Issue 4 (15th February 2023)
- Main Title:
- High-performance ITO/a-IGZO heterostructure TFTs enabled by thickness-dependent carrier concentration and band alignment manipulation
- Authors:
- Park, Chan-Yong
Jeon, Seong-Pil
Park, Joon Bee
Park, Hun-Bum
Kim, Dong-Hyuk
Yang, Seong Hwan
Kim, Gahye
Jo, Jeong-Wan
Oh, Min Suk
Kim, Myunggil
Kim, Yong-Hoon
Park, Sung Kyu - Abstract:
- Abstract: Utilization of highly conductive metal-oxide (MO) film such as indium-tin-oxide (ITO) in a channel layer has been considered as a promising strategy to realize high-mobility thin-film transistors (TFTs). However, achieving high-mobility is typically restricted by severe negative threshold voltage (Vth ) shift and large off-current which are consequences of channel thickness increment. Here, to realize high-mobility MO TFTs with low Vth and off-current level, a heterogeneous ITO/amorphous indium-gallium-zinc-oxide ( a -IGZO) channel structure was implemented. In the channel, the ultrathin (4 nm) ITO layer contributes to retain high electron concentration and boost the mobility, while the overlayered a -IGZO layer mitigates Vth shift and off-current increase. The ITO/ a -IGZO TFTs optimized via the thickness-dependent carrier concentration of ITO and band alignment manipulation in the bilayer considerably improved the device performance showing saturation field-effect mobility of >61 cm 2 /V·s (average of 58.2 ± 2 cm 2 /V·s), subthreshold slope of <120 mV/decade (average of 129 ± 12 mV/decade), and current on/off ratio of >5 × 10 10 . Various electrical characterization and technological computer-aided design simulation were performed to establish a plausible mechanism explaining enhanced mobility and Vth regulation in the ITO/ a -IGZO TFTs. Additionally, systematic stability tests and spectroscopic analysis were carried out to evaluate the operational stability ofAbstract: Utilization of highly conductive metal-oxide (MO) film such as indium-tin-oxide (ITO) in a channel layer has been considered as a promising strategy to realize high-mobility thin-film transistors (TFTs). However, achieving high-mobility is typically restricted by severe negative threshold voltage (Vth ) shift and large off-current which are consequences of channel thickness increment. Here, to realize high-mobility MO TFTs with low Vth and off-current level, a heterogeneous ITO/amorphous indium-gallium-zinc-oxide ( a -IGZO) channel structure was implemented. In the channel, the ultrathin (4 nm) ITO layer contributes to retain high electron concentration and boost the mobility, while the overlayered a -IGZO layer mitigates Vth shift and off-current increase. The ITO/ a -IGZO TFTs optimized via the thickness-dependent carrier concentration of ITO and band alignment manipulation in the bilayer considerably improved the device performance showing saturation field-effect mobility of >61 cm 2 /V·s (average of 58.2 ± 2 cm 2 /V·s), subthreshold slope of <120 mV/decade (average of 129 ± 12 mV/decade), and current on/off ratio of >5 × 10 10 . Various electrical characterization and technological computer-aided design simulation were performed to establish a plausible mechanism explaining enhanced mobility and Vth regulation in the ITO/ a -IGZO TFTs. Additionally, systematic stability tests and spectroscopic analysis were carried out to evaluate the operational stability of the device, and it is suggested that Sn ion diffusing from ITO to the heterogeneous interface can be responsible for enhanced stability by reducing the oxygen vacancy defects. … (more)
- Is Part Of:
- Ceramics international. Volume 49:Issue 4(2023)
- Journal:
- Ceramics international
- Issue:
- Volume 49:Issue 4(2023)
- Issue Display:
- Volume 49, Issue 4 (2023)
- Year:
- 2023
- Volume:
- 49
- Issue:
- 4
- Issue Sort Value:
- 2023-0049-0004-0000
- Page Start:
- 5905
- Page End:
- 5914
- Publication Date:
- 2023-02-15
- Subjects:
- Thin-film transistors (TFTs) -- High mobility -- Bilayer oxide TFT -- Dual channel conduction -- Sn diffusion
Ceramics -- Periodicals
Céramique industrielle -- Périodiques
Ceramics
Periodicals
Electronic journals
666 - Journal URLs:
- http://www.sciencedirect.com/science/journal/02728842 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.ceramint.2022.10.098 ↗
- Languages:
- English
- ISSNs:
- 0272-8842
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3119.015000
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