Cite
HARVARD Citation
Chen, T. et al. (2022). Impact of CH4 addition on the electron properties and electric field dynamics in a Ar nanosecond-pulsed dielectric barrier discharge. Plasma sources science & technology. p. . [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Chen, T. et al. (2022). Impact of CH4 addition on the electron properties and electric field dynamics in a Ar nanosecond-pulsed dielectric barrier discharge. Plasma sources science & technology. p. . [Online].