The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering. Issue 35 (19th October 2022)
- Record Type:
- Journal Article
- Title:
- The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering. Issue 35 (19th October 2022)
- Main Title:
- The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
- Authors:
- Zhang, Bo
Cicmancova, Veronika
Ludvik, Benes
Slang, Stanislav
Kutalek, Petr
Motola, Martin
Wagner, Tomas - Abstract:
- Abstract: 2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only ≈3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3 . In the application of photocatalysis, an improved two‐step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation. Abstract : 2D monolayers and thin film WO3 are accomplished via magnetron sputtering. 2D monolayers are only formed on a cooled substrate. Resistive switching device and photocatalysis of 2D WO3 are discussed. The failure of resistive switching device is closely related with the 2D structure of WO3 . In photocatalysis, the enhancements of photocatalysis are obtained with 2D WO3 after their exfoliation.
- Is Part Of:
- Advanced materials interfaces. Volume 9:Issue 35(2022)
- Journal:
- Advanced materials interfaces
- Issue:
- Volume 9:Issue 35(2022)
- Issue Display:
- Volume 9, Issue 35 (2022)
- Year:
- 2022
- Volume:
- 9
- Issue:
- 35
- Issue Sort Value:
- 2022-0009-0035-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-10-19
- Subjects:
- magnetron sputtering -- magnetron sputtering -- resistive random‐access memory -- two‐dimensional materials
Materials science -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2196-7350 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/admi.202201790 ↗
- Languages:
- English
- ISSNs:
- 2196-7350
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.898450
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 24688.xml