Cite
HARVARD Citation
Khong, Y. et al. (2021). Effect of Plasma Treatment on Metal Oxide p–n Thin Film Diodes Fabricated at Room Temperature. Advanced materials interfaces. 8 (10), p. n/a. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Khong, Y. et al. (2021). Effect of Plasma Treatment on Metal Oxide p–n Thin Film Diodes Fabricated at Room Temperature. Advanced materials interfaces. 8 (10), p. n/a. [Online].