Sterilization of stem‐end rot of mango using dielectric barrier discharge and investigation of sterilization factors. Issue 4 (9th October 2021)

• Record Type: Journal Article
• Authors: Nakakoga, Yuta; Tada, Yoichiro; Sakoda, Tatsuya; Tazawa, Kazutoshi; Ichikawa, Hiroyuki
• Is Part Of: Electronics and communications in Japan. Volume 104:Issue 4(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-10-09
• Subjects: dielectric barrier discharge -- mango -- radical -- stem‐end rot; Electronics -- Periodicals; Telecommunication -- Periodicals; 621.6805
• DOI: 10.1002/ecj.12325
• Languages: English
• ISSNs: 1942-9533

Abstract

Abstract: To develop a sterilization method for controlling post‐harvest stem‐end rot of mango, we examined to sterilize fungi on peduncle by using the dielectric barrier discharge (DBD). Additionally, to investigate the sterilization factors, we performed sterilization against stem‐end rot on agar medium by using the DBD generated in air, argon gas, or oxygen gas. It was found that the DBD can sterilize fungi with high probability. Ultra‐violet ray and O3 do not contribute to the sterilization. High energy electrons, and radicals such as O and OH play an essential role for the sterilization.