Cite
HARVARD Citation
Yu, W. et al. (2023). Balance between oxidation and tribological behaviors at elevated temperatures of Hf1-xWxN films by optimizing W content. Vacuum. p. . [Online].
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Yu, W. et al. (2023). Balance between oxidation and tribological behaviors at elevated temperatures of Hf1-xWxN films by optimizing W content. Vacuum. p. . [Online].