Direct Laser Patterning of a 2D WSe2 Logic Circuit. (12th March 2021)

• Record Type: Journal Article
• Authors: Zhu, Chao; Zhao, Xiaoxu; Wang, Xiaowei; Chen, Jieqiong; Yu, Peng; Liu, Song; Zhou, Jiadong; Fu, Qundong; Zeng, Qingsheng; He, Yongmin; Edgar, James H.; Pennycook, Stephen J.; Liu, Fucai; Liu, Zheng
• Is Part Of: Advanced functional materials. Volume 31:Number 21(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-03-12
• Subjects: controllable doping -- direct laser patterning -- logic circuit -- WSe 2; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.202009549
• Languages: English
• ISSNs: 1616-301X

Abstract

Abstract: Carrier doping is the basis of the modern semiconductor industry. Great efforts are put into the control of carrier doping for 2D semiconductors, especially the layered transition metal dichalcogenides. Here, the direct laser patterning of WSe2 devices via light‐induced hole doping is systematically studied. By changing the laser power, scan speed, and the number of irradiation times, different levels of hole doping can be achieved in the pristine electron‐transport‐dominated WSe2, without obvious sample thinning. Scanning transmission electron microscopy characterization reveals that the oxidation of the laser‐radiated WSe2 is the origin of the carrier doping. Photocurrent mapping shows that after the same amount of laser irradiation, with increasing thickness, the laser patterned PN junction changes from the pure lateral to the vertical‐lateral hybrid structure, accompanied by the decrease in the open circuit voltage. The vertical‐lateral hybrid PN junction can be tuned to a pure lateral one by further irradiation, showing possibilities to construct complex junction profiles. Moreover, a NOR gate circuit is demonstrated by direct patterning of p‐doped channels using laser irradiation without introducing passive layers and metal electrodes with different work functions. This method simplifies device fabrication procedures and shows a promising future in large scale logic circuit applications. Abstract : Controllable hole doping of WSe2 by direct laser irradiation is studied systematically. Scanning transmission electron microscopy characterizations confirm the doping mechanism to be the oxidization‐induced charge transfer. Different PN junction profiles can be achieved in samples with different thicknesses and under different amounts of laser irradiation. A laser‐patterned NOR gate circuit is demonstrated, showing potential for large‐scale circuit fabrications.