Analytical subthreshold current model of the dual-material tri-gate (DMTG) MOSFET and its application for subthreshold logic gate. (1st December 2022)

• Record Type: Journal Article
• Authors: Liu, Wentao; Chiang, Te-Kuang; Yan, Yan; Liou, Juin J
• Is Part Of: Engineering research express. Volume 4:Number 4(2022)
• Publication Date: 2022-12-01
• Subjects: dual-material -- subthreshold current -- subthreshold logic gate -- noise margin (NM) -- equal NM design (END); Engineering -- Periodicals; 620.005
• DOI: 10.1088/2631-8695/ac9e8d
• Languages: English
• ISSNs: 2631-8695

Abstract

Abstract: Multi-gate MOSFETs are considered for realizing ultra-low-power circuits due to their superior channel control capability and short channel effect (SCE) resistance. To achieve this goal, it is necessary to establish a suitable compact device circuit model for them. However, current research focuses more on single-material multi-gate MOSFET, and there is no research report on dual-material logic gates. In this work, we develop a subthreshold current model for dual-material tri-gate (DMTG) MOSFET. It is found that the gate metal close to the source can affect the subthreshold characteristics of the transistor to a greater extent. Moreover, combined with the equivalent transistor model, the noise margin (NM) model of the subthreshold inverter composed of DMTG MOSFETs is developed. The nearly equal NM can be obtained by equal NM design (END). An appropriate work function can be selected through END to obtain the optimal NM when designing the inverter. The NM under different device geometric parameters is given, and the simulation result shows that the model accuracy reaches 98%. Finally, the effect of DMTG structure on the device drain induced barrier lowering (DIBL) is given, which effectively reduces DIBL by 42%. These models still remain high accuracy when the device channel length shrink down to 20 nm, which provide the possibility for DMTG MOSFET to be effectively applied to ultra-low-power circuits.