A comprehensive picture of roughness evolution in organic crystalline growth: the role of molecular aspect ratio. Issue 11 (7th September 2022)
- Record Type:
- Journal Article
- Title:
- A comprehensive picture of roughness evolution in organic crystalline growth: the role of molecular aspect ratio. Issue 11 (7th September 2022)
- Main Title:
- A comprehensive picture of roughness evolution in organic crystalline growth: the role of molecular aspect ratio
- Authors:
- Dull, Jordan T.
Chen, Xiangyu
Johnson, Holly M.
Otani, Maria Clara
Schreiber, Frank
Clancy, Paulette
Rand, Barry P. - Abstract:
- Abstract : The molecular aspect ratio of organic small molecules is shown to impact the roughness evolution during crystal growth through complementary experimental and computational studies. Abstract : Exploiting the capabilities of organic semiconductors for applications ranging from light-emitting diodes to photovoltaics to lasers relies on the creation of ordered, smooth layers for optimal charge carrier mobilities and exciton diffusion. This, in turn, creates a demand for organic small molecules that can form smooth thin film crystals via homoepitaxy. We have studied a set of small-molecule organic semiconductors that serve as templates for homoepitaxy. The surface roughness of these materials is measured as a function of adlayer film thickness from which the growth exponent ( β ) is extracted. Notably, we find that three-dimensional molecules that have low molecular aspect ratios (AR) tend to remain smooth as thickness increases (small β ). This is in contrast to planar or rod-like molecules with high AR that quickly roughen (large β ). Molecular dynamics simulations find that the Ehrlich–Schwöbel barrier ( E ES ) alone is unable to fully explain this trend. We further investigated the mobility of ad-molecules on the crystalline surface to categorize their diffusion behaviors and the effects of aggregation to account for the different degrees of roughness that we observed. Our results suggest that low AR molecules have low molecular mobility and moderate E ES whichAbstract : The molecular aspect ratio of organic small molecules is shown to impact the roughness evolution during crystal growth through complementary experimental and computational studies. Abstract : Exploiting the capabilities of organic semiconductors for applications ranging from light-emitting diodes to photovoltaics to lasers relies on the creation of ordered, smooth layers for optimal charge carrier mobilities and exciton diffusion. This, in turn, creates a demand for organic small molecules that can form smooth thin film crystals via homoepitaxy. We have studied a set of small-molecule organic semiconductors that serve as templates for homoepitaxy. The surface roughness of these materials is measured as a function of adlayer film thickness from which the growth exponent ( β ) is extracted. Notably, we find that three-dimensional molecules that have low molecular aspect ratios (AR) tend to remain smooth as thickness increases (small β ). This is in contrast to planar or rod-like molecules with high AR that quickly roughen (large β ). Molecular dynamics simulations find that the Ehrlich–Schwöbel barrier ( E ES ) alone is unable to fully explain this trend. We further investigated the mobility of ad-molecules on the crystalline surface to categorize their diffusion behaviors and the effects of aggregation to account for the different degrees of roughness that we observed. Our results suggest that low AR molecules have low molecular mobility and moderate E ES which creates a downward funneling effect leading to smooth crystal growth. … (more)
- Is Part Of:
- Materials horizons. Volume 9:Issue 11(2022)
- Journal:
- Materials horizons
- Issue:
- Volume 9:Issue 11(2022)
- Issue Display:
- Volume 9, Issue 11 (2022)
- Year:
- 2022
- Volume:
- 9
- Issue:
- 11
- Issue Sort Value:
- 2022-0009-0011-0000
- Page Start:
- 2752
- Page End:
- 2761
- Publication Date:
- 2022-09-07
- Subjects:
- Materials -- Research -- Periodicals
543.0284 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/mh#recentarticles&all ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d2mh00854h ↗
- Languages:
- English
- ISSNs:
- 2051-6347
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5395.035000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 24224.xml