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HARVARD Citation
Liu, F. et al. (2022). High‐Temperature Stability Amorphous Ternary AlBN Dielectric Films on N++GaN. Advanced engineering materials. 24 (10), p. n/a. [Online].
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Liu, F. et al. (2022). High‐Temperature Stability Amorphous Ternary AlBN Dielectric Films on N++GaN. Advanced engineering materials. 24 (10), p. n/a. [Online].