Density gradient segregation of Cu at the Si2Hf/Al interface in an Al-Si-Cu-Hf alloy. (1st January 2023)

• Record Type: Journal Article
• Authors: Jia, Zhihong; Xing, Yuan; Ning, Yaru; Ding, Lipeng; Ehlers, F.J.H.; Hao, Longlong; Liu, Qing
• Is Part Of: Scripta materialia. Number 222(2023)
• Publication Date: 2023-01-01
• Subjects: Aluminum -- Precipitates -- Interfacial segregation -- HAADF-STEM -- Density functional theory; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2022.115022
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: Solute segregation at the Si2 Hf/Al interface of an Al-Si-Cu-Hf alloy was investigated by combining high angle annular dark-field scanning transmission electron microscopy (HAADF-STEM), energy dispersive X-ray spectroscopy (EDS) and density functional theory (DFT) calculation. Density gradient segregation of Cu atoms was observed at the habit plane of the nanobelt-like Si2 Hf phase, with the Cu concentrations gradually increasing to the Si2 Hf/Al interface. This gradient segregation of Cu is found to be beneficial for decreasing both the strain and interfacial energies and thereby promoting the stabilization of the Si2 Hf precipitates during heat treatment. This study provides an insight into the enhanced stability of Si2 Hf precipitates in Al-Si-Cu-Hf alloy. Graphical abstract: Image, graphical abstract