Cite
HARVARD Citation
Huster, N. et al. (2022). SnO deposition via water based ALD employing tin(ii) formamidinate: precursor characterization and process development. Dalton transactions. 51 (39), pp. 14970-14979. [Online].
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Huster, N. et al. (2022). SnO deposition via water based ALD employing tin(ii) formamidinate: precursor characterization and process development. Dalton transactions. 51 (39), pp. 14970-14979. [Online].