Automated alignment in mask‐free photolithography enabled by micro‐LED arrays. Issue 19 (31st May 2021)

• Record Type: Journal Article
• Authors: Stonehouse, M.; Blanchard, A.; Guilhabert, B.; Zhang, Y.; Gu, E.; Watson, I. M.; Herrnsdorf, J.; Dawson, M. D.
• Is Part Of: Electronics letters. Volume 57:Issue 19(2021)
• Page Start: 721
• Page End: 723
• Publication Date: 2021-05-31
• Subjects: Electronics -- Periodicals; 621.381
• DOI: 10.1049/ell2.12244
• Languages: English
• ISSNs: 0013-5194

Abstract

Abstract: We present an automated control system for micro scale positioning, based on single pixel imaging and fluorescence. By projecting a chequerboard array of CMOS controllable μ‐LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo‐lithography system using the automated control capability and a second μ‐LED array to photo‐cure customisable structures in photoresist with alignment referenced to the fluorescent markers.