Cite
HARVARD Citation
Xue, J. et al. (2019). Investigation on the interfacial stability of multilayered Cu–W films at elevated deposition temperatures during co-sputtering. Vacuum. pp. 162-169. [Online].
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Xue, J. et al. (2019). Investigation on the interfacial stability of multilayered Cu–W films at elevated deposition temperatures during co-sputtering. Vacuum. pp. 162-169. [Online].