Mechanism for anisotropic ejection of atoms from fcc (100) metal surface by low-energy argon ion bombardment: Molecular dynamics simulation. (November 2021)
- Record Type:
- Journal Article
- Title:
- Mechanism for anisotropic ejection of atoms from fcc (100) metal surface by low-energy argon ion bombardment: Molecular dynamics simulation. (November 2021)
- Main Title:
- Mechanism for anisotropic ejection of atoms from fcc (100) metal surface by low-energy argon ion bombardment: Molecular dynamics simulation
- Authors:
- Zhu, Guo
Liu, Wenyu
Gan, Zhiyin
Xiao, Baijun - Abstract:
- Abstract: In order to thoroughly clarify the formation mechanism of "Wehner spots" during the low-energy sputtering of fcc (100) surface, molecular dynamics (MD) method was employed to investigate the sputtering of Cu (100) surface by 500 eV argon ion bombardment. Simulation program monitored the emission trajectories and velocities of sputtered atoms as well as the forces acting on them. Simulation results revealed that the preferential ejection of sputtered atoms along close-packed directions, which caused the formation of "Wehner spots", resulted mainly from the regular interaction between sputtered atoms and their neighbor atoms. The formation mechanism of "Wehner spots" is that sputtered atom is first horizontally focused and then undergoes a ski-jump takeoff along close-packed direction. The generality of this mechanism was further verified by supplementary molecular dynamics simulations. Furthermore, this investigation demonstrated that local environment surrounding sputtered atom rather than simple collision processes transferring initial recoil energy to sputtered atom dominated the anisotropic sputtering of fcc (100) surface in low energy regime. Highlights: Simple collision processes transferring recoil energy to sputtered atoms do not dominate their anisotropic ejections. Local environment dominates the anisotropic ejection of sputtered atoms from fcc (100) surface. The mechanism of the preferential ejection of sputtered atoms from fcc (100) surface was proposed.Abstract: In order to thoroughly clarify the formation mechanism of "Wehner spots" during the low-energy sputtering of fcc (100) surface, molecular dynamics (MD) method was employed to investigate the sputtering of Cu (100) surface by 500 eV argon ion bombardment. Simulation program monitored the emission trajectories and velocities of sputtered atoms as well as the forces acting on them. Simulation results revealed that the preferential ejection of sputtered atoms along close-packed directions, which caused the formation of "Wehner spots", resulted mainly from the regular interaction between sputtered atoms and their neighbor atoms. The formation mechanism of "Wehner spots" is that sputtered atom is first horizontally focused and then undergoes a ski-jump takeoff along close-packed direction. The generality of this mechanism was further verified by supplementary molecular dynamics simulations. Furthermore, this investigation demonstrated that local environment surrounding sputtered atom rather than simple collision processes transferring initial recoil energy to sputtered atom dominated the anisotropic sputtering of fcc (100) surface in low energy regime. Highlights: Simple collision processes transferring recoil energy to sputtered atoms do not dominate their anisotropic ejections. Local environment dominates the anisotropic ejection of sputtered atoms from fcc (100) surface. The mechanism of the preferential ejection of sputtered atoms from fcc (100) surface was proposed. The mechanism can be briefly described as "horizontal focusing and ski-jump takeoff". … (more)
- Is Part Of:
- Vacuum. Volume 193(2021)
- Journal:
- Vacuum
- Issue:
- Volume 193(2021)
- Issue Display:
- Volume 193, Issue 2021 (2021)
- Year:
- 2021
- Volume:
- 193
- Issue:
- 2021
- Issue Sort Value:
- 2021-0193-2021-0000
- Page Start:
- Page End:
- Publication Date:
- 2021-11
- Subjects:
- Molecular dynamics -- Sputtering -- Anisotropic emission of sputtered atoms -- Low-energy ion bombardment -- Surface
Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2021.110524 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 23800.xml