Fourier‐transform infrared spectroscopy of ethyl lactate decomposition and thin‐film coating in a filamentary and a glow dielectric barrier discharge. Issue 7 (13th May 2021)
- Record Type:
- Journal Article
- Title:
- Fourier‐transform infrared spectroscopy of ethyl lactate decomposition and thin‐film coating in a filamentary and a glow dielectric barrier discharge. Issue 7 (13th May 2021)
- Main Title:
- Fourier‐transform infrared spectroscopy of ethyl lactate decomposition and thin‐film coating in a filamentary and a glow dielectric barrier discharge
- Authors:
- Milaniak, Natalia
Laroche, Gaétan
Massines, Françoise - Abstract:
- Abstract: Glow and filamentary regimes of atmospheric pressure plasma‐enhanced chemical vapor deposition in a planar dielectric barrier discharge configuration were compared for thin‐film deposition from ethyl lactate (EL). EL decomposition in the plasma phase and thin‐film composition were both characterized by Fourier‐transform infrared spectroscopy. EL chemical bonds' concentration along the gas flow decreases progressively in the glow dielectric barrier discharge (GDBD), whereas it drastically oscillates in the filamentary dielectric barrier discharge (FDBD), with values higher than that of the initial mixture. EL decomposition route depends on the discharge regime, as the decrease of the concentration of the different investigated bonds is different for an identical amount of energy provided to EL molecules. CO2 is systematically formed reaching concentrations of 25 and 40 ppm, respectively, in FDBD and GDBD. Abstract : Atmospheric pressure plasma enhanced chemical vapor deposition (AP PECVD) in a dielectric barrier discharge (DBD) configuration was used for thin film synthesis. Ethyl lactate (EL) decomposition in glow and filamentary discharges was followed using a space‐resolved in‐situ FTIR system. Calibration curves were built to measure the concentration of EL molecular bonds and plot their concentration evolution as a function of the energy provided per precursor molecule. These data were correlated with the composition of the deposited coatings, as deduced fromAbstract: Glow and filamentary regimes of atmospheric pressure plasma‐enhanced chemical vapor deposition in a planar dielectric barrier discharge configuration were compared for thin‐film deposition from ethyl lactate (EL). EL decomposition in the plasma phase and thin‐film composition were both characterized by Fourier‐transform infrared spectroscopy. EL chemical bonds' concentration along the gas flow decreases progressively in the glow dielectric barrier discharge (GDBD), whereas it drastically oscillates in the filamentary dielectric barrier discharge (FDBD), with values higher than that of the initial mixture. EL decomposition route depends on the discharge regime, as the decrease of the concentration of the different investigated bonds is different for an identical amount of energy provided to EL molecules. CO2 is systematically formed reaching concentrations of 25 and 40 ppm, respectively, in FDBD and GDBD. Abstract : Atmospheric pressure plasma enhanced chemical vapor deposition (AP PECVD) in a dielectric barrier discharge (DBD) configuration was used for thin film synthesis. Ethyl lactate (EL) decomposition in glow and filamentary discharges was followed using a space‐resolved in‐situ FTIR system. Calibration curves were built to measure the concentration of EL molecular bonds and plot their concentration evolution as a function of the energy provided per precursor molecule. These data were correlated with the composition of the deposited coatings, as deduced from their FTIR spectra, recorded at corresponding positions. … (more)
- Is Part Of:
- Plasma processes and polymers. Volume 18:Issue 7(2021)
- Journal:
- Plasma processes and polymers
- Issue:
- Volume 18:Issue 7(2021)
- Issue Display:
- Volume 18, Issue 7 (2021)
- Year:
- 2021
- Volume:
- 18
- Issue:
- 7
- Issue Sort Value:
- 2021-0018-0007-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2021-05-13
- Subjects:
- biomaterials -- chemical composition -- dielectric barrier discharge -- FSK -- FTIR -- in situ spectroscopy -- plasma -- thin film
Plasma polymerization -- Periodicals
Plasma-enhanced chemical vapor deposition -- Periodicals
Plasma chemistry -- Periodicals - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1612-8869 ↗
http://www3.interscience.wiley.com/cgi-bin/jtoc/106571203 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/ppap.202000248 ↗
- Languages:
- English
- ISSNs:
- 1612-8850
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6528.781000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 23762.xml