Study of a pulsed post‐discharge plasma deposition process of APTES: synthesis of highly organic pp‐APTES thin films with NH2 functionalized polysilsesquioxane evidences. Issue 4 (25th January 2019)
- Record Type:
- Journal Article
- Title:
- Study of a pulsed post‐discharge plasma deposition process of APTES: synthesis of highly organic pp‐APTES thin films with NH2 functionalized polysilsesquioxane evidences. Issue 4 (25th January 2019)
- Main Title:
- Study of a pulsed post‐discharge plasma deposition process of APTES: synthesis of highly organic pp‐APTES thin films with NH2 functionalized polysilsesquioxane evidences
- Authors:
- Bulou, Simon
Lecoq, Elodie
Loyer, François
Frache, Gilles
Fouquet, Thierry
Gueye, Magamou
Belmonte, Thierry
Choquet, Patrick - Abstract:
- Abstract : This article reports the use of pulsed remote Ar‐O2 microwave plasma assisted chemical vapor deposition with an −NH2 containing organosilicon precursor ((3‐Aminopropyl)triethoxysilane: APTES). It is shown that modifying the plasma pulses duration ( t on ) and the plasma off duration ( t off ) allows to finely tune the deposited layer composition. In addition, the results of this work demonstrate that an important film growth occurs during t off, which results in an increased −NH2 density. Besides, high resolution MALDI‐ORBITRAP Mass spectrometry analysis clearly points out that APTES oligomers up to eight base units, including silsesquioxanes (cages), and cyclosiloxanes (rings) molecules with intact −NH2 groups are embedded into the as grown pp‐APTES thin film. Abstract : Pulsed remote microwave PACVD of APTES is investigated. Modifying the "plasma off" duration allows to tune the coating composition. In addition, a significant film growth occurs during "plasma off, " resulting in an increased −NH2 density and less cross‐linked structure. APTES oligomers up to 8 base units, including silsesquioxanes (cages) and cyclosiloxanes (rings) molecules with intact −NH2 groups are also detected.
- Is Part Of:
- Plasma processes and polymers. Volume 16:Issue 4(2019)
- Journal:
- Plasma processes and polymers
- Issue:
- Volume 16:Issue 4(2019)
- Issue Display:
- Volume 16, Issue 4 (2019)
- Year:
- 2019
- Volume:
- 16
- Issue:
- 4
- Issue Sort Value:
- 2019-0016-0004-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2019-01-25
- Subjects:
- microwave discharges -- plasma‐enhanced chemical vapour deposition (PECVD) -- plasma polymerization -- pulsed discharges -- remote plasma processes
Plasma polymerization -- Periodicals
Plasma-enhanced chemical vapor deposition -- Periodicals
Plasma chemistry -- Periodicals - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1612-8869 ↗
http://www3.interscience.wiley.com/cgi-bin/jtoc/106571203 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/ppap.201800177 ↗
- Languages:
- English
- ISSNs:
- 1612-8850
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6528.781000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 23604.xml