Orientation relationships in Cu/Nb bilayers deposited on (001) and (111) NaCl substrate. (November 2022)

• Record Type: Journal Article
• Authors: Wei, Qiangmin
• Is Part Of: Scripta materialia. Number 220(2022)
• Publication Date: 2022-11
• Subjects: Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2022.114915
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: Cu/Nb bilayers with equal layer thickness of 35 nm were grown on (001) and (111) NaCl substrates using electron beam evaporation at 350 °C. Plan-view Cu/Nb bilayer samples were prepared by dissolving NaCl substrate in water. Transmission electron microscopy (TEM) was performed to study the orientation relationships (ORs). It was found that ORs in Cu/Nb bilayers are dependent on the substrate orientation. For Cu/Nb deposited on (001) NaCl, the dominant OR is Pitsch. For Cu/Nb deposited on (111) NaCl, the dominant OR is Nishiyama-Wasserman (N-W). The preferential ORs found in the Cu/Nb bilayers can be successfully predicted by the invariant line model. Graphical abstract: Image, graphical abstract