Phase field approach for void dynamics with interface stresses at the nanoscale. (September 2020)
- Record Type:
- Journal Article
- Title:
- Phase field approach for void dynamics with interface stresses at the nanoscale. (September 2020)
- Main Title:
- Phase field approach for void dynamics with interface stresses at the nanoscale
- Authors:
- Javanbakht, Mahdi
Ghaedi, Mohammad Sadegh - Abstract:
- Abstract: In this paper, a thermodynamically consistent interface stress is derived for the solid-gas interface of nanovoids within the concept of the phase field approach and using the laws of thermodynamics. The Cahn-Hilliard (CH) equation describes the evolution of nanovoid concentration which varies between 0 for perfect solid to 1 for gas. Considering the gradient term of the nanovoid concentration in the deformed state results in an inelastic term in the stress tensor which depends only on and is along the gradient of the nanovoid concentration. Also, multiplying the free energy of mixing and the gradient energy by the ratio of mass densities in the undeformed and deformed states leads to an inelastic hydrostatic stress. The combination of the above inelastic stresses gives the correct inelastic interface stress . It is proved that for a stationary interface which does not support elastic stresses, the obtained interface stress reduces to the biaxial tension which coincides with a sharp-interface approach limit. The interface stress changes the total stress distribution and affects the elastic stress field. Thus, due to the significant effect of the elastic energy on void dynamics, it can indirectly affect the void nucleation and growth. The coupled CH and elasticity equations are solved using the finite element method and several examples of void evolution are studied consisting of thermal induced initiation and propagation of a planar void, thermal induced circularAbstract: In this paper, a thermodynamically consistent interface stress is derived for the solid-gas interface of nanovoids within the concept of the phase field approach and using the laws of thermodynamics. The Cahn-Hilliard (CH) equation describes the evolution of nanovoid concentration which varies between 0 for perfect solid to 1 for gas. Considering the gradient term of the nanovoid concentration in the deformed state results in an inelastic term in the stress tensor which depends only on and is along the gradient of the nanovoid concentration. Also, multiplying the free energy of mixing and the gradient energy by the ratio of mass densities in the undeformed and deformed states leads to an inelastic hydrostatic stress. The combination of the above inelastic stresses gives the correct inelastic interface stress . It is proved that for a stationary interface which does not support elastic stresses, the obtained interface stress reduces to the biaxial tension which coincides with a sharp-interface approach limit. The interface stress changes the total stress distribution and affects the elastic stress field. Thus, due to the significant effect of the elastic energy on void dynamics, it can indirectly affect the void nucleation and growth. The coupled CH and elasticity equations are solved using the finite element method and several examples of void evolution are studied consisting of thermal induced initiation and propagation of a planar void, thermal induced circular void growth, evolution of void nanostructure under biaxial compression and evolution of void nanostructure with an initially, randomly distributed void concentration. The obtained results show the significant effect of the interface stress on the total stress distribution and consequently, a different distribution of thermodynamic driving force which can affect the nanostructure evolution and deformation. The interface stress represents a promotive effect on the void growth which results in a faster void growth and a larger void concentration. Also, the results reveal a significant effect of temperature, elastic properties and sample size on the interface stress. … (more)
- Is Part Of:
- International journal of engineering science. Volume 154(2020:Sep.)
- Journal:
- International journal of engineering science
- Issue:
- Volume 154(2020:Sep.)
- Issue Display:
- Volume 154 (2020)
- Year:
- 2020
- Volume:
- 154
- Issue Sort Value:
- 2020-0154-0000-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-09
- Subjects:
- Void dynamics -- Phase field -- Interface stress -- Nanoscale -- Finite element method
Engineering -- Periodicals
Ingénierie -- Périodiques
Engineering
Periodicals
620 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00207225 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.ijengsci.2020.103279 ↗
- Languages:
- English
- ISSNs:
- 0020-7225
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 4542.240000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 23456.xml