Cite
HARVARD Citation
Minjauw, M. et al. (2022). Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant. Dalton transactions. 51 (28), pp. 10721-10727. [Online].
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Minjauw, M. et al. (2022). Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant. Dalton transactions. 51 (28), pp. 10721-10727. [Online].