Cite
HARVARD Citation
Baldry, M. et al. (2021). Continuum modelling of an asymmetric CCRF argon plasma reactor: Influence of higher excited states and sensitivity to model parameters. Plasma processes and polymers. 18 (6), p. n/a. [Online].
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Baldry, M. et al. (2021). Continuum modelling of an asymmetric CCRF argon plasma reactor: Influence of higher excited states and sensitivity to model parameters. Plasma processes and polymers. 18 (6), p. n/a. [Online].