Unveiling the Dynamic Oxidative Etching Mechanisms of Nanostructured Metals/Metallic Oxides in Liquid Media Through In Situ Transmission Electron Microscopy. (8th July 2022)
- Record Type:
- Journal Article
- Title:
- Unveiling the Dynamic Oxidative Etching Mechanisms of Nanostructured Metals/Metallic Oxides in Liquid Media Through In Situ Transmission Electron Microscopy. (8th July 2022)
- Main Title:
- Unveiling the Dynamic Oxidative Etching Mechanisms of Nanostructured Metals/Metallic Oxides in Liquid Media Through In Situ Transmission Electron Microscopy
- Authors:
- Zhang, Junyu
Sun, Zhefei
Kang, Zewen
Lin, Haichen
Liu, Haodong
He, Yang
Zeng, Zhiyuan
Zhang, Qiaobao - Abstract:
- Abstract: Oxidative etching in nanostructured metals and metallic oxides plays a fundamental role in numerous areas of chemical synthesis and materials processing for the semiconductor industry. An in‐depth understanding of the oxidative etching mechanisms is of great significance to design various fascinating nanomaterials for practical application. In situ liquid cell transmission electron microscopy (TEM) has the merits of high temporal and spatial resolutions in real‐time, and thus it can provide solid evidence directly for the dynamic evaluation of oxidative etching in nanostructured materials that occur in solution. Herein, the recent progress of oxidative etching in nanostructured metals and metallic oxides is overviewed. First, the advancements in liquid cells designs are briefly introduced for in situ TEM observation. Subsequently, in situ liquid cell TEM/STEM advances for the oxide etching mechanisms in different surface chemistry surroundings are systematically described. In addition, both the galvanic replacement and electrochemical etching reactions are also discussed. Finally, the challenges and opportunities in utilizing the in situ liquid cell TEM technique to visualize a specific dynamic oxidative etching process are proposed. This review will provide deep insights into dynamic changes in oxidative etching processes of nanostructured materials and assist in formulating design rules for developing high‐end advanced devices. Abstract : In this review, theAbstract: Oxidative etching in nanostructured metals and metallic oxides plays a fundamental role in numerous areas of chemical synthesis and materials processing for the semiconductor industry. An in‐depth understanding of the oxidative etching mechanisms is of great significance to design various fascinating nanomaterials for practical application. In situ liquid cell transmission electron microscopy (TEM) has the merits of high temporal and spatial resolutions in real‐time, and thus it can provide solid evidence directly for the dynamic evaluation of oxidative etching in nanostructured materials that occur in solution. Herein, the recent progress of oxidative etching in nanostructured metals and metallic oxides is overviewed. First, the advancements in liquid cells designs are briefly introduced for in situ TEM observation. Subsequently, in situ liquid cell TEM/STEM advances for the oxide etching mechanisms in different surface chemistry surroundings are systematically described. In addition, both the galvanic replacement and electrochemical etching reactions are also discussed. Finally, the challenges and opportunities in utilizing the in situ liquid cell TEM technique to visualize a specific dynamic oxidative etching process are proposed. This review will provide deep insights into dynamic changes in oxidative etching processes of nanostructured materials and assist in formulating design rules for developing high‐end advanced devices. Abstract : In this review, the recent progress of the oxide etching mechanisms of nanostructured metals/metallic oxides revealed by an in situ liquid cell TEM technique are systematically summarized. The challenges and opportunities for utilizing this technique to understand the oxide etching mechanisms are also discussed, aiming to offer guidance for the rational design and engineering of nanomaterials for high‐end advanced devices. … (more)
- Is Part Of:
- Advanced functional materials. Volume 32:Number 36(2022)
- Journal:
- Advanced functional materials
- Issue:
- Volume 32:Number 36(2022)
- Issue Display:
- Volume 32, Issue 36 (2022)
- Year:
- 2022
- Volume:
- 32
- Issue:
- 36
- Issue Sort Value:
- 2022-0032-0036-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-07-08
- Subjects:
- electrochemical etching reactions -- galvanic replacements -- in situ liquid cell TEM -- oxidative etching -- surface chemistry surroundings
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.202204976 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 23299.xml