Synthesis and characterization of CrB2 thin films grown by DC magnetron sputtering. (15th July 2021)

• Record Type: Journal Article
• Authors: Dorri, Megan M.; Thörnberg, Jimmy; Hellgren, Niklas; Palisaitis, Justinas; Petruhins, Andrejs; Klimashin, Fedor F.; Hultman, Lars; Petrov, Ivan; Persson, Per O.Å.; Rosen, Johanna
• Is Part Of: Scripta materialia. Number 200(2021)
• Publication Date: 2021-07-15
• Subjects: Chromium -- Borides -- PVD -- Epitaxy -- Lattice defects; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2021.113915
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: CrBx thin films with 1.90 ≤ x ≤ 2.08 have been deposited by direct-current magnetron sputtering (DCMS) from a stoichiometric CrB2 target at 5 and 20 mTorr (0.67 and 2.67 Pa) Ar pressure onto sapphire (0001) substrates. All films, irrespective of deposition conditions, exhibit a (0001) texture. Attesting to the achievement of close-to-stoichiometric composition, epitaxial film growth is observed at 900°C, while film growth at 500 °C yields (0001) fiber texture. Film composition does not depend on substrate temperature but exhibits slightly reduced B content with increasing pressure for samples deposited at 900°C. Excess B in the overstoichiometric epitaxial CrB2.08 films segregates to form B-rich inclusions. Understoichiometry in CrB1.90 films is accommodated by Cr-rich stacking faults on { 1 1 ¯ 00 } prismatic planes. Graphical Abstract: Image, graphical abstract