Explicitly semantic representation of pattern and combined geometrical specification. (2nd April 2020)

• Record Type: Journal Article
• Authors: Peng, Zhiguo; Huang, Meifa; Zhong, Yanru; Chen, Leilei; Liu, Guanghao
• Other Names: Topcu Ahmet E. guestEditor.; Cibikdiken Ali Osman guestEditor.
• Is Part Of: Concurrency and computation. Volume 34:Number 9(2022)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2020-04-02
• Subjects: ontology -- pattern specification -- semantic representation -- skin model -- tolerance semantics; Parallel processing (Electronic computers) -- Periodicals; Parallel computers -- Periodicals; 004.35
• DOI: 10.1002/cpe.5743
• Languages: English
• ISSNs: 1532-0626

Abstract

Abstract: Model‐based definition (MBD) containing all product and manufacturing information (PMI) has become the data source of future product development because of its incomparable advantages over traditional two‐dimensional drawings. In the whole life cycle of product development, it is an urgent problem to realize the sharing of geometric tolerance specification information of PMI among different CAx (CAD, CAE, CAM, etc.) and the automatic interpretation of its semantics by computer. In this paper, the semantic representation ontology of pattern and combined geometrical specification is studied based on the new generation GPS theory and the construction process is introduced in detail through an example. Benefiting from the logic‐based semantics of the web ontology language (OWL) and semantic web rule language (SWRL), the pattern and combined geometrical specification semantic can be interpreted directly by computer and has the advantages of clear, unambiguous, and consistent at different stages of the product life cycle. At the same time, it can automatically check the consistency of knowledge, reason new knowledge, and semantic query.