Simplistic approach to alleviate noise coupling issues in 3D IC integration. (2020)
- Record Type:
- Journal Article
- Title:
- Simplistic approach to alleviate noise coupling issues in 3D IC integration. (2020)
- Main Title:
- Simplistic approach to alleviate noise coupling issues in 3D IC integration
- Authors:
- Pragathi, Dadaipally
Kumari, Ch Usha
Rani, M. Usha
Kumar, T. Santosh
Padma, Tatiparti
Kumar, P. Sriram
Panigrahy, Asisa Kumar - Abstract:
- Highlights: Noise coupling reduced even for the high frequency electrical signals up to 1 THz. Reduction of noise coupling achieved by just changing the core material and proper liner material selection. It opens up the window towards the future IC Integration (3D IC). Abstract: Through-silicon-via (TSV) technology has emerged as the key technology to enable 3D IC integration. 3D integration is seen as the leading candidate, which can help in sustaining Moore's Law to future IC technology nodes. It clearly set a benchmark to the IC industry due to its tremendous benefits in performance, data bandwidth, and supports heterogeneous integration. In 3D IC structure TSV's are used to carry the overall electrical signal between the layers. The major drawback in the TSV based 3D integration is noise coupling between aggressive (electrical signal carrying TSV; ETSV) and victim TSV's (ground). It can be reduced by creating very good isolation between TSV's and Si substrate by using different liner materials around TSV's. In this work, we have addressed various TSV models to reduce noise coupling between the TSV's. The models we have studied are single layer model and stacked layers of liner model. Apart from this we have studied how the core materials in the TSV reduces noise coupling between aggressive and victim TSV's. Also, we have shown the high frequency study for proposed models. Finally, our work shows single layer model with Crystalline-Germanium is comparably better noiseHighlights: Noise coupling reduced even for the high frequency electrical signals up to 1 THz. Reduction of noise coupling achieved by just changing the core material and proper liner material selection. It opens up the window towards the future IC Integration (3D IC). Abstract: Through-silicon-via (TSV) technology has emerged as the key technology to enable 3D IC integration. 3D integration is seen as the leading candidate, which can help in sustaining Moore's Law to future IC technology nodes. It clearly set a benchmark to the IC industry due to its tremendous benefits in performance, data bandwidth, and supports heterogeneous integration. In 3D IC structure TSV's are used to carry the overall electrical signal between the layers. The major drawback in the TSV based 3D integration is noise coupling between aggressive (electrical signal carrying TSV; ETSV) and victim TSV's (ground). It can be reduced by creating very good isolation between TSV's and Si substrate by using different liner materials around TSV's. In this work, we have addressed various TSV models to reduce noise coupling between the TSV's. The models we have studied are single layer model and stacked layers of liner model. Apart from this we have studied how the core materials in the TSV reduces noise coupling between aggressive and victim TSV's. Also, we have shown the high frequency study for proposed models. Finally, our work shows single layer model with Crystalline-Germanium is comparably better noise coupling reduction even at higher frequency. … (more)
- Is Part Of:
- Materials today. Volume 33:Part 7(2020)
- Journal:
- Materials today
- Issue:
- Volume 33:Part 7(2020)
- Issue Display:
- Volume 33, Issue 7, Part 7 (2020)
- Year:
- 2020
- Volume:
- 33
- Issue:
- 7
- Part:
- 7
- Issue Sort Value:
- 2020-0033-0007-0007
- Page Start:
- 4007
- Page End:
- 4011
- Publication Date:
- 2020
- Subjects:
- 3D IC -- ETSV -- FEM Simulator -- Material modeling -- Noise Coupling -- Through Silicon Via
Materials science -- Congresses -- Periodicals
620.1 - Journal URLs:
- http://www.sciencedirect.com/science/journal/22147853 ↗
http://www.sciencedirect.com/ ↗ - DOI:
- 10.1016/j.matpr.2020.06.380 ↗
- Languages:
- English
- ISSNs:
- 2214-7853
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 22922.xml