Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF. (24th January 2016)

• Record Type: Journal Article
• Authors: Lopes, Fabio; Cardozo Amorin, Luís Henrique; da Silva Martins, Larissa; Urbano, Alexandre; Roberto Appoloni, Carlos; Cesareo, Roberto
• Other Names: Pan Jisheng Academic Editor.
• Is Part Of: Journal of spectroscopy. Volume 2016(2016)
• Publication Date: 2016-01-24
• Subjects: Spectrum analysis -- Periodicals; 543.505
• DOI: 10.1155/2016/9509043
• Languages: English
• ISSNs: 2314-4920

Abstract

Abstract : Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2 O5 nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity K α of calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium K α rays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface.