Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films. (9th March 2015)

• Record Type: Journal Article
• Authors: Du, Shiwen; Li, Yongtang
• Other Names: Giannazzo Filippo Academic Editor.
• Is Part Of: Advances in materials science and engineering. Volume 2015(2015)
• Publication Date: 2015-03-09
• Subjects: Materials science -- Periodicals; Materials science; Periodicals; 620.11
• DOI: 10.1155/2015/969580
• Languages: English
• ISSNs: 1687-8434

Abstract

Abstract : Cu thin films were deposited on Si substrates using direct current (DC) magnetron sputtering. Microstructure evolution and mechanical properties of Cu thin films with different annealing temperatures were investigated by atomic force microscopy (AFM), X-ray diffraction (XRD), and nanoindentation. The surface morphology, roughness, and grain size of the Cu films were characterized by AFM. The minimization of energy including surface energy, interface energy, and strain energy (elastic strain energy and plastic strain energy) controlled the microstructural evolution. A classical Hall-Petch relationship was exhibited between the yield stress and grain size. The residual stress depended on crystal orientation. The residual stress as-deposited was of tension and decreased with decreasing of (111) orientation. The ratio of texture coefficient of (111)/(220) can be used as a merit for the state of residual stress.