Cite
HARVARD Citation
Wolf, S. et al. (2016). (Invited) Rapid In-Situ Carbon and Oxygen Cleaning of In0.53Ga0.47As(001) and Si0.5Ge0.5(110) Surfaces via a H2 RF Downstream Plasma. ECS transactions. pp. 291-302. [Online].
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Wolf, S. et al. (2016). (Invited) Rapid In-Situ Carbon and Oxygen Cleaning of In0.53Ga0.47As(001) and Si0.5Ge0.5(110) Surfaces via a H2 RF Downstream Plasma. ECS transactions. pp. 291-302. [Online].