Optimization of Electrolysis Conditions for Ti Film Electrodeposition from Water-Soluble KF–KCl Molten Salts. Issue 14 (1st January 2019)

• Record Type: Journal Article
• Authors: Norikawa, Yutaro; Yasuda, Kouji; Nohira, Toshiyuki
• Is Part Of: Journal of the Electrochemical Society. Volume 166:Issue 14(2019)
• Page Start: D755
• Page End: D759
• Publication Date: 2019-01-01
• Subjects: Electrodeposition -- Molten Salts - High temperature molten salts -- Electrodeposition -- Molten salt -- Titanium; Electrochemistry -- Periodicals; 541.3705
• DOI: 10.1149/2.1291914jes
• Languages: English
• ISSNs: 0013-4651

Abstract

Abstract : Optimized conditions for Ti film electrodeposition were investigated in water-soluble KF–KCl (45:55 mol%) molten salt at 923 K. K3 TiF6 was prepared in the melt via a comproportionation reaction between K2 TiF6 and Ti sponges. The K3 TiF6 solubility was determined to be 1.48 mol%. Galvanostatic electrolysis was conducted on Ni plate substrates at various K3 TiF6 concentrations (0.28, 0.70, and 1.43 mol%) and current densities (25–150 mA cm −2 ). Surface and cross-sectional scanning electron microscopy observations showed that adherent, compact, and smooth Ti films were obtained at higher K3 TiF6 concentrations and lower current densities. A corrosion test was conducted for the Ti-coated Ni plate using linear sweep voltammetry, which showed that the Ti films have no cracks or voids.