Cite
HARVARD Citation
Tu, H. et al. (2015). Effect of Porogen Incorporation on Pore Morphology of Low-k SiCxNy Films Prepared Using PECVD. ECS journal of solid state science and technology. pp. N3015-N3022. [Online].
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Tu, H. et al. (2015). Effect of Porogen Incorporation on Pore Morphology of Low-k SiCxNy Films Prepared Using PECVD. ECS journal of solid state science and technology. pp. N3015-N3022. [Online].