Formation Mechanism of Transparent Mo6 Metal Atom Cluster Film Prepared by Electrophoretic Deposition. Issue 7 (1st January 2017)

• Record Type: Journal Article
• Authors: Nguyen, T. K. N.; Dierre, B.; Grasset, F.; Renaud, A.; Cordier, S.; Lemoine, P.; Ohashi, N.; Uchikoshi, T.
• Is Part Of: Journal of the Electrochemical Society. Volume 164:Issue 7(2017)
• Page Start: D412
• Page End: D418
• Publication Date: 2017-01-01
• Subjects: electrophoretic deposition -- metal cluster unit; Electrochemistry -- Periodicals; 541.3705
• DOI: 10.1149/2.0591707jes
• Languages: English
• ISSNs: 0013-4651

Abstract

Abstract : Among the solution deposition techniques, electrophoretic deposition (EPD) is a fairly rapid and low cost two-step process well-known for ceramic shaping and conductive surface coating. Recently we have reported the fabrication of transparent inorganic thin film composed of octahedral molybdenum clusters and shown that the stabilization of the cluster solutions during EPD is very important to obtain high quality films. In this study, we selected the Cs2 Mo6 Br i 8 Br a 6 or ((n-C4 H9 )4 N)2 Mo6 Br i 8 Br a 6 clusters compound ( i = inner ligands, a = apical ligands) as precursors in a Methyl Ethyl Ketone (MEK) solution to fabricate the inorganic Mo6 cluster transparent film on a conductive indium tin oxide (ITO) glass substrate. For the first time, the mechanism for the deposition process of metal clusters is proposed based on results obtained by the combination of complementary techniques such as infrared spectroscopy, X-ray analysis and electron microscopy. The Mo6 film on the ITO glass substrate exhibiting a Br-rich layer is quickly deposited during the first stage of the EPD followed by a multilayer structure consisting of two types of cluster compounds, [Mo6 Br i 8 Br a 4 (H2 O) a 2 ] and (H3 O)2 [Mo6 Br i 8 Br a 4 (OH) a 2 ].