Communication—Galvanic Deposition of Gold on Silicon from Au(I) Alkaline Fluoride-Free Solutions. Issue 14 (1st January 2016)

• Record Type: Journal Article
• Authors: Djokić, S. S.; Antić, Ž.; Djokić, N. S.; Thundat, T.
• Is Part Of: Journal of the Electrochemical Society. Volume 163:Issue 14(2016)
• Page Start: D818
• Page End: D820
• Publication Date: 2016-01-01
• Subjects: electroless deposition -- galvanic displacement -- gold -- non-fluoride solutions -- silicon; Electrochemistry -- Periodicals; 541.3705
• DOI: 10.1149/2.0991614jes
• Languages: English
• ISSNs: 0013-4651

Abstract

Abstract : Deposition of gold from alkaline fluoride-free solutions containing Au(I) ions onto silicon surfaces has been demonstrated. This deposition takes place at room temperature and does not require the presence of a reducing agent in the solution. The results clearly show that Au(I) ions can be reduced to Au(0) by silicon and, as a consequence, gold metal can be deposited at the surface of the substrate.