Flexible Platform Oriented: Unipolar‐Type Hybrid Dual‐Channel Scalable Field‐Effect Phototransistors Array Based on Tellurium Nanowires and Tellurium‐Film with Highly Linear Photoresponsivity. (24th February 2022)
- Record Type:
- Journal Article
- Title:
- Flexible Platform Oriented: Unipolar‐Type Hybrid Dual‐Channel Scalable Field‐Effect Phototransistors Array Based on Tellurium Nanowires and Tellurium‐Film with Highly Linear Photoresponsivity. (24th February 2022)
- Main Title:
- Flexible Platform Oriented: Unipolar‐Type Hybrid Dual‐Channel Scalable Field‐Effect Phototransistors Array Based on Tellurium Nanowires and Tellurium‐Film with Highly Linear Photoresponsivity
- Authors:
- Naqi, Muhammad
Choi, Kyung Hwan
Cho, Yongin
Rho, Hyun Yeol
Cho, Haewon
Pujar, Pavan
liu, Na
Kim, Hyun‐Suk
Choi, Jae‐Young
Kim, Sunkook - Abstract:
- Abstract: Here, a novel method is introduced to synthesize the uniform hybrid structure of tellurium nanowires (TeNWs) and tellurium‐film (Te‐film) for flexible field‐effect transistor (FET) array device to exhibit excellent electrical, mechanical, and optical performance. To fabricate such a device, all the processes are performed at low temperatures (< 100 °C) with easy processing methods. The uniformity of the hybrid structure of TeNWs/Te‐film is confirmed using scanning electron microscopy (SEM) and Raman spectroscopy with a comparison of the bare TeNWs‐film. Electrical properties of the TeNWs/Te‐based FET device exhibits high mobility of 5.35 cm 2 V −1 s −1 and on/off ratio of >10 4 along with stable and uniform results of the transistor array device, which consists of 50 devices. The optical properties show highly linear photodetection behavior in terms of threshold voltage shift, responsivity, sensitivity, photocurrent, detectivity, and time‐domain behavior. Also, the various stability tests are performed to confirm the consistency of the device in terms of positive bias stress, negative bias stress, positive bias illumination stress, long‐term stability response (up to 60 days), mechanical bending stress, and the results reveal a constant and consistent behavior of the device, which can be attributed to enable wide range applications in the field of electronics devices. Abstract : Herein, a novel method is introduced to synthesize and fabricate the uniform hybridAbstract: Here, a novel method is introduced to synthesize the uniform hybrid structure of tellurium nanowires (TeNWs) and tellurium‐film (Te‐film) for flexible field‐effect transistor (FET) array device to exhibit excellent electrical, mechanical, and optical performance. To fabricate such a device, all the processes are performed at low temperatures (< 100 °C) with easy processing methods. The uniformity of the hybrid structure of TeNWs/Te‐film is confirmed using scanning electron microscopy (SEM) and Raman spectroscopy with a comparison of the bare TeNWs‐film. Electrical properties of the TeNWs/Te‐based FET device exhibits high mobility of 5.35 cm 2 V −1 s −1 and on/off ratio of >10 4 along with stable and uniform results of the transistor array device, which consists of 50 devices. The optical properties show highly linear photodetection behavior in terms of threshold voltage shift, responsivity, sensitivity, photocurrent, detectivity, and time‐domain behavior. Also, the various stability tests are performed to confirm the consistency of the device in terms of positive bias stress, negative bias stress, positive bias illumination stress, long‐term stability response (up to 60 days), mechanical bending stress, and the results reveal a constant and consistent behavior of the device, which can be attributed to enable wide range applications in the field of electronics devices. Abstract : Herein, a novel method is introduced to synthesize and fabricate the uniform hybrid structure of tellurium nanowires (TeNWs) and tellurium‐film (Te‐film) for flexible field‐effect transistor array device to exhibit excellent electrical, mechanical, and optical performance. The stability analysis tests reveal a highly stable and consistent behavior. The proposed device with stable performance can enable new opportunities to broaden the application in the optoelectronics field. … (more)
- Is Part Of:
- Advanced Electronic Materials. Volume 8:Number 7(2022)
- Journal:
- Advanced Electronic Materials
- Issue:
- Volume 8:Number 7(2022)
- Issue Display:
- Volume 8, Issue 7 (2022)
- Year:
- 2022
- Volume:
- 8
- Issue:
- 7
- Issue Sort Value:
- 2022-0008-0007-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-02-24
- Subjects:
- bias stress -- FET -- hybrid structure -- phototransistor -- scalable devices -- tellurium -- tellurium‐nanowires
Materials -- Electric properties -- Periodicals
Materials science -- Periodicals
Magnetic materials -- Periodicals
Electronic apparatus and appliances -- Periodicals
537 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2199-160X ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/aelm.202101331 ↗
- Languages:
- English
- ISSNs:
- 2199-160X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.848400
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 22567.xml