Cite
HARVARD Citation
Glechner, T. et al. (2022). High temperature oxidation resistance of physical vapor deposited Hf-Si-B2±z thin films. Corrosion science. p. . [Online].
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Glechner, T. et al. (2022). High temperature oxidation resistance of physical vapor deposited Hf-Si-B2±z thin films. Corrosion science. p. . [Online].