Cite
HARVARD Citation
Vishwakarma, S. et al. (2020). Silicon negative ion implantation induced vacancy defects in thermally grown SiO2 thin films. Radiation effects and defects in solids. 175 (7), pp. 695-703. [Online].
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Vishwakarma, S. et al. (2020). Silicon negative ion implantation induced vacancy defects in thermally grown SiO2 thin films. Radiation effects and defects in solids. 175 (7), pp. 695-703. [Online].