Enhancement of ferroelectricity in sputtered HZO thin films by catalytically generated atomic hydrogen treatment. (1st July 2022)

• Record Type: Journal Article
• Authors: Mohit, ; Wen, Yuli; Hara, Yuki; Migita, Shinji; Ota, Hiroyuki; Morita, Yukinori; Ohdaira, Keisuke; Tokumitsu, Eisuke
• Is Part Of: Japanese journal of applied physics. Volume 61:Number SH(2022)
• Publication Date: 2022-07-01
• Subjects: ferroelectric -- hafnium dioxide -- cat-h treatment -- sputtering -- stability; Physics -- Periodicals; 621.05
• DOI: 10.35848/1347-4065/ac5a95
• Languages: English
• ISSNs: 0021-4922

Abstract

Abstract: Effects of catalytically generated atomic hydrogen (Cat-H) treatment on electrical properties of 10 nm thick sputtered hafnium-zirconium-oxide (HZO) films have been investigated. It is demonstrated that the Cat-H treatment to the as-deposited sputtered HZO film is effective to stabilize the metastable ferroelectric orthorhombic phase after crystallization. The enhancement of ferroelectricity by the Cat-H treatment is observed for the sputtered HZO films crystalized at a reduced pressure of 100 Pa, nitrogen and air, and the enhancement is pronounced for the films crystallized in nitrogen and air ambient. In addition, it is found that the Cat-H treatment also improves the stability against re-annealing.