Cite
HARVARD Citation
Liu, T. et al. (2022). Copper Oxidation Improves Dodecanethiol Blocking Ability in Area‐Selective Atomic Layer Deposition. Advanced materials interfaces. 9 (19), p. n/a. [Online].
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Liu, T. et al. (2022). Copper Oxidation Improves Dodecanethiol Blocking Ability in Area‐Selective Atomic Layer Deposition. Advanced materials interfaces. 9 (19), p. n/a. [Online].