Cite
HARVARD Citation
Ke, J. et al. (2022). Delamination of MoS2/SiO2 interfaces under nanoindentation. Physical chemistry chemical physics. 24 (26), pp. 15991-16002. [Online].
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Ke, J. et al. (2022). Delamination of MoS2/SiO2 interfaces under nanoindentation. Physical chemistry chemical physics. 24 (26), pp. 15991-16002. [Online].