Cite
HARVARD Citation
Catapang, A. et al. (2022). Performance of a reactive magnetron sputtering ion source using water vapor plasma. Journal of physics. 2244 (1), p. . [Online].
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Catapang, A. et al. (2022). Performance of a reactive magnetron sputtering ion source using water vapor plasma. Journal of physics. 2244 (1), p. . [Online].