Ultrashort pulse laser processing of silica at high repetition rates—from network change to residual strain. (28th July 2016)

• Record Type: Journal Article
• Authors: Zimmermann, Felix; Lancry, Matthieu; Plech, Anton; Richter, Sören; Ullsperger, Tobias; Poumellec, Bertrand; Tünnermann, Andreas; Nolte, Stefan
• Is Part Of: International journal of applied glass science. Volume 8:Number 2(2017:Jun.)
• Page Start: 233
• Page End: 238
• Publication Date: 2016-07-28
• Subjects: Raman spectroscopy ‐ characterization -- silicate ‐ glass forming systems -- x‐ray scattering ‐ characterization; Glass -- Periodicals; Glass manufacture -- Periodicals; 666.1
• DOI: 10.1111/ijag.12221
• Languages: English
• ISSNs: 2041-1286

Abstract

Abstract: We report on the analysis of silica‐based glasses after processing with ultrashort laser pulses at high repetition rates. Heat accumulation leads to strong local heating of the glass. The subsequent quenching results in a fictive temperature rise that scales with the repetition rate. Consequently, the relative volume change leads to residual tensile strain within the modified volume of larger than 10 −3, which is confirmed by wide‐angle X‐ray scattering (WAXS) measurements. Studying the surface topography after cleaving of laser‐modified regions allows for quantification of the corresponding elastic strain as well as the glass density behavior on the fictive temperature.