Cite
HARVARD Citation
Lyu, P. et al. (2022). Damage-free finishing of Lu2O3 by combining plasma-assisted etching and low-pressure polishing. CIRP annals. 71 (1), pp. 169-172. [Online].
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Lyu, P. et al. (2022). Damage-free finishing of Lu2O3 by combining plasma-assisted etching and low-pressure polishing. CIRP annals. 71 (1), pp. 169-172. [Online].