Impact of Interconnect Spacing on Crosstalk for Multi-layered Graphene Nanoribbon. Issue 2 (4th March 2022)

• Record Type: Journal Article
• Authors: Kumbhare, Vijay Rao; Paltani, Punya Prasanna; Majumder, Manoj Kumar
• Is Part Of: IETE journal of research. Volume 68:Issue 2(2022)
• Page Start: 1064
• Page End: 1073
• Publication Date: 2022-03-04
• Subjects: Crosstalk induced delay -- Equivalent single-conductor (ESC) -- Multi-conductor transmission line (MTL) -- Multi-layer graphene nanoribbon (MLGNR) -- Peak noise; Electronics -- Periodicals; Telecommunication -- Periodicals; Electronics; Telecommunication; Periodicals; 621.38
• DOI: 10.1080/03772063.2019.1637788
• Languages: English
• ISSNs: 0377-2063

Abstract

Abstract : In the recent research world, the overall system performance primarily depends on interconnect delay instead of the gate delay at the nanoscale regime. The impact of spacing between the lines and shrinking technology are rigorously investigated on peak noise and delay under the crosstalk for rough-edged multi-layered graphene nanoribbon (MLGNR) at global lengths. Using a rough-edged MLGNR, a multi-conductor transmission line (MTL) model is accurately demonstrated by considering the effect of coupling capacitance and inter-layer tunnelling conductance. By incorporating lengths and spacing between the coupled MLGNR interconnect, the equivalent electrical model exhibits an insignificant error of 0.91% only. Moreover, the proposed equivalent model is used to demonstrate the delay under the influence of crosstalk and peak noise for coupled interconnect lines. Using industry standard HSPICE, the overall delay and peak noise under the crosstalk are reduced by 45.1% and 9%, respectively at advanced 14 nm technology in comparison to the 32 nm for a fixed layer of rough-edged MLGNR based global VLSI interconnects.